Features of and in situ measurements on absorbing TiO sub / x/ films produced by reactive dc magnetron-plasmatron sputtering

Features of and in situ measurements on absorbing TiO sub / x/ films produced by reactive dc magnetron-plasmatron sputtering

Use of dc magnetron-plasmatron discharge allows direct production of TiO sub / x/ films with an O:Ti atomic ratio x = 0- 2 by varying the pO sub / 2/ pressure of an Ar-O sub / 2/ gas mixture. This method ensures reproducibility of the refractive index of TiO sub / 2/ films for dielectric multilayer...

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Veröffentlicht in:Thin solid films 1980-01, Vol.72 (N-3), p.475-483
Hauptverfasser: Schiller, Siegfried, Beister, G, Schneider, S
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container_title Thin solid films
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creator Schiller, Siegfried
Beister, G
Schneider, S
description Use of dc magnetron-plasmatron discharge allows direct production of TiO sub / x/ films with an O:Ti atomic ratio x = 0- 2 by varying the pO sub / 2/ pressure of an Ar-O sub / 2/ gas mixture. This method ensures reproducibility of the refractive index of TiO sub / 2/ films for dielectric multilayer stacks and gives absorbing TiO sub / x/ films with defined stoichiometries consistent with requirements for simple solar absorber systems.
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title Features of and in situ measurements on absorbing TiO sub / x/ films produced by reactive dc magnetron-plasmatron sputtering
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