The effects of hydrogen on the nitridation of silicon

It is believed that H sub 2 assists the removal of a reaction-inhibiting oxide film on the Si surface. The effect of H sub 2 on the Beta-phase forming process tends to be more marked than that on Alpha-phase reaction.

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Veröffentlicht in:Journal of materials science 1979-04, Vol.14 (4), p.1007-1008
Hauptverfasser: Campos-Loriz, D, Riley, F L
Format: Artikel
Sprache:eng
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Zusammenfassung:It is believed that H sub 2 assists the removal of a reaction-inhibiting oxide film on the Si surface. The effect of H sub 2 on the Beta-phase forming process tends to be more marked than that on Alpha-phase reaction.
ISSN:0022-2461
1573-4803
DOI:10.1007/BF00550738