Reaction of fluorine atoms with SiO sub 2
The heterogeneous reaction of F atoms with SiO sub 2 (thermal oxide) was measured using a discharge-flow tube technique. I. G.
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| Veröffentlicht in: | Journal of applied physics 1979-01, Vol.50 (10), p.6211-6213 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 6213 |
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| container_issue | 10 |
| container_start_page | 6211 |
| container_title | Journal of applied physics |
| container_volume | 50 |
| creator | Flamm, D L Mogab, C J Sklaver, E R |
| description | The heterogeneous reaction of F atoms with SiO sub 2 (thermal oxide) was measured using a discharge-flow tube technique. I. G. |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 1979-01, Vol.50 (10), p.6211-6213 |
| issn | 0021-8979 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_23554372 |
| source | AIP Digital Archive |
| title | Reaction of fluorine atoms with SiO sub 2 |
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