Properties and characteristics of Al-films deposited in dc and rf magnetron systems

An investigation has been made of the glow discharge and deposition characteristics of Al and AlO sub(x)-films using a planar magnetron at power inputs up to 1500W, i.e. similar to 50W/cm super(2). Films were prepared in Ar, Ar+O sub(2) and Ar+H sub(2) mixtures. Although H sub(2) addition can convert the "oxygen" discharge mode to that of pure Ar, the sorption of H sub(2) by the deposit produces film blisters. Also the impurity O sub(2)-content of films deposited in Ar+H sub(2) mixtures were similar to those for Ar discharges when desorbed oxygen contaminants were present. Information is given on the effects of O sub(2) on the operating voltage and negative bias for dc and rf magnetrons, respectively. Also data is presented on the deposition rates for metal and oxide film growth.