Effects of oxidation and oxidation under load on strength distributions of Si sub / 3/ N sub / 4

The RT strength distributions of a sintered and a hot-pressed Si sub / 3/ N sub / 4/ were examined in the as-machined condition, after oxidation at 1370 degrees C and after oxidation under load at 1370 degrees . The strength-controlling flaw populations were highly transient in nature. Both the dura...

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Veröffentlicht in:Journal of the American Ceramic Society 1982-06, Vol.65 (N-6), p.317-320
Hauptverfasser: Easler, Timothy E, Bradt, R C, Tressler, Richard E
Format: Artikel
Sprache:eng
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Zusammenfassung:The RT strength distributions of a sintered and a hot-pressed Si sub / 3/ N sub / 4/ were examined in the as-machined condition, after oxidation at 1370 degrees C and after oxidation under load at 1370 degrees . The strength-controlling flaw populations were highly transient in nature. Both the duration of oxidation and the magnitude of the applied load were observed to effect changes in strength. This dynamic situation is related to both strengthening and weakening processes, which at times may occur simultaneously in the same strength distribution.
ISSN:0002-7820