Oxygen adsorption on Ge(111) surface: II. Alkali metal-covered surfaces

Oxygen adsorption on an alkali metal (a.m.)-covered Ge(111) surface has been studied by means of Auger electron spectroscopy (AES), electron energy loss spectroscopy (ELS), thermal desorption (TD), and work function measurements (WF). It was found that the presence of a.m. results in enhancement of the oxygen adsorption rate. The initial values of the sticking coefficient, S 0, are exponential functions of the work function changes caused by the a.m. adsorption. It was shown that no germanium oxide phases are formed on an alkali-covered Ge surface at 300 K. The oxidation rate at high temperatures is limited by the rearrangement processes taking place in the surface GeO layer. The results obtained show that the alkali metal perturbs the GeO bond to a certain extent but no alkali oxide formation was observed at a.m. covertages under investigation.