Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors

In recent decades, oxide thin-film transistors (TFTs) have attracted a great deal of attention as a promising technology in terms of next-generation electronics due to their outstanding electrical performance. However, achieving robust electrical characteristics under various environments is a cruci...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:ACS applied materials & interfaces 2020-01, Vol.12 (2), p.2615-2624
Hauptverfasser: Tak, Young Jun, Keene, Scott Tom, Kang, Byung Ha, Kim, Won-Gi, Kim, Si Joon, Salleo, Alberto, Kim, Hyun Jae
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 2624
container_issue 2
container_start_page 2615
container_title ACS applied materials & interfaces
container_volume 12
creator Tak, Young Jun
Keene, Scott Tom
Kang, Byung Ha
Kim, Won-Gi
Kim, Si Joon
Salleo, Alberto
Kim, Hyun Jae
description In recent decades, oxide thin-film transistors (TFTs) have attracted a great deal of attention as a promising technology in terms of next-generation electronics due to their outstanding electrical performance. However, achieving robust electrical characteristics under various environments is a crucial challenge for successful realization of oxide-based electronic applications. To resolve the limitation, we propose a highly flexible and reliable heterogeneous organic passivation layer composed of stacked parylene-C and diketopyrrolopyrrole-polymer films for improving stability of oxide TFTs under various environments and mechanical stress. The presented multifunctional heterogeneous organic (MHO) passivation leads to high-performance oxide TFTs by: (1) improving their electrical characteristics, (2) protecting them from external reactive molecules, and (3) blocking light exposure to the oxide layer. As a result, oxide TFTs with MHO passivation exhibit outstanding stability in ambient air as well as under light illumination: the threshold voltage shift of the device is almost 0 V under severe negative bias illumination stress condition (white light of 5700 lx, gate voltage of −20 V, and drain voltage of 10.1 V for 20 000 s). Furthermore, since the MHO passivation layer exhibits high mechanical stability at a bending radius of ≤5 mm and can be deposited at room temperature, this technique is expected to be useful in the fabrication of flexible/wearable devices.
doi_str_mv 10.1021/acsami.9b16898
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_2328348347</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2328348347</sourcerecordid><originalsourceid>FETCH-LOGICAL-a330t-d7b589dc4335df9d30603ca6c8c25522f24bbd0ce5607beae9d532249f86ddec3</originalsourceid><addsrcrecordid>eNp1kE1Lw0AQhhdRrF9Xj7JHEVM3u9l8HKVYK1QqWs9hszupW5Js3UnE3v3hRlt7EwZmGJ55YR5CzkM2DBkPb5RGVdthVoRxmqV75CjMoihIueT7uzmKBuQYcclYLDiTh2QgwlSyhCdH5Ouxq1pbdo1urWtUdU2fnauDOdQr8KrtPNAn7zQgqqKCazqBFrxbQAOuQzrzC9VYTZ8Uov1QPxF0qtbgaek8nX1aA_QFaqtdYzrd9rv5m22Csa1qOveqQYv9Ek_JQakqhLNtPyGv47v5aBJMZ_cPo9tpoIRgbWCSQqaZ0ZEQ0pSZESxmQqtYp5pLyXnJo6IwTIOMWVKAgsxIwXmUlWlsDGhxQi43uSvv3jvANq8taqgq9ftOzgVPRdRX0qPDDaq9Q_RQ5itva-XXecjyH_P5xny-Nd8fXGyzu6IGs8P_VPfA1QboD_Ol63xvG_9L-wYro5Gr</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2328348347</pqid></control><display><type>article</type><title>Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors</title><source>ACS Publications</source><creator>Tak, Young Jun ; Keene, Scott Tom ; Kang, Byung Ha ; Kim, Won-Gi ; Kim, Si Joon ; Salleo, Alberto ; Kim, Hyun Jae</creator><creatorcontrib>Tak, Young Jun ; Keene, Scott Tom ; Kang, Byung Ha ; Kim, Won-Gi ; Kim, Si Joon ; Salleo, Alberto ; Kim, Hyun Jae</creatorcontrib><description>In recent decades, oxide thin-film transistors (TFTs) have attracted a great deal of attention as a promising technology in terms of next-generation electronics due to their outstanding electrical performance. However, achieving robust electrical characteristics under various environments is a crucial challenge for successful realization of oxide-based electronic applications. To resolve the limitation, we propose a highly flexible and reliable heterogeneous organic passivation layer composed of stacked parylene-C and diketopyrrolopyrrole-polymer films for improving stability of oxide TFTs under various environments and mechanical stress. The presented multifunctional heterogeneous organic (MHO) passivation leads to high-performance oxide TFTs by: (1) improving their electrical characteristics, (2) protecting them from external reactive molecules, and (3) blocking light exposure to the oxide layer. As a result, oxide TFTs with MHO passivation exhibit outstanding stability in ambient air as well as under light illumination: the threshold voltage shift of the device is almost 0 V under severe negative bias illumination stress condition (white light of 5700 lx, gate voltage of −20 V, and drain voltage of 10.1 V for 20 000 s). Furthermore, since the MHO passivation layer exhibits high mechanical stability at a bending radius of ≤5 mm and can be deposited at room temperature, this technique is expected to be useful in the fabrication of flexible/wearable devices.</description><identifier>ISSN: 1944-8244</identifier><identifier>EISSN: 1944-8252</identifier><identifier>DOI: 10.1021/acsami.9b16898</identifier><identifier>PMID: 31850727</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><ispartof>ACS applied materials &amp; interfaces, 2020-01, Vol.12 (2), p.2615-2624</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a330t-d7b589dc4335df9d30603ca6c8c25522f24bbd0ce5607beae9d532249f86ddec3</citedby><cites>FETCH-LOGICAL-a330t-d7b589dc4335df9d30603ca6c8c25522f24bbd0ce5607beae9d532249f86ddec3</cites><orcidid>0000-0001-9191-9079 ; 0000-0002-6635-670X ; 0000-0002-6879-9256</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/acsami.9b16898$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/acsami.9b16898$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/31850727$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Tak, Young Jun</creatorcontrib><creatorcontrib>Keene, Scott Tom</creatorcontrib><creatorcontrib>Kang, Byung Ha</creatorcontrib><creatorcontrib>Kim, Won-Gi</creatorcontrib><creatorcontrib>Kim, Si Joon</creatorcontrib><creatorcontrib>Salleo, Alberto</creatorcontrib><creatorcontrib>Kim, Hyun Jae</creatorcontrib><title>Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors</title><title>ACS applied materials &amp; interfaces</title><addtitle>ACS Appl. Mater. Interfaces</addtitle><description>In recent decades, oxide thin-film transistors (TFTs) have attracted a great deal of attention as a promising technology in terms of next-generation electronics due to their outstanding electrical performance. However, achieving robust electrical characteristics under various environments is a crucial challenge for successful realization of oxide-based electronic applications. To resolve the limitation, we propose a highly flexible and reliable heterogeneous organic passivation layer composed of stacked parylene-C and diketopyrrolopyrrole-polymer films for improving stability of oxide TFTs under various environments and mechanical stress. The presented multifunctional heterogeneous organic (MHO) passivation leads to high-performance oxide TFTs by: (1) improving their electrical characteristics, (2) protecting them from external reactive molecules, and (3) blocking light exposure to the oxide layer. As a result, oxide TFTs with MHO passivation exhibit outstanding stability in ambient air as well as under light illumination: the threshold voltage shift of the device is almost 0 V under severe negative bias illumination stress condition (white light of 5700 lx, gate voltage of −20 V, and drain voltage of 10.1 V for 20 000 s). Furthermore, since the MHO passivation layer exhibits high mechanical stability at a bending radius of ≤5 mm and can be deposited at room temperature, this technique is expected to be useful in the fabrication of flexible/wearable devices.</description><issn>1944-8244</issn><issn>1944-8252</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp1kE1Lw0AQhhdRrF9Xj7JHEVM3u9l8HKVYK1QqWs9hszupW5Js3UnE3v3hRlt7EwZmGJ55YR5CzkM2DBkPb5RGVdthVoRxmqV75CjMoihIueT7uzmKBuQYcclYLDiTh2QgwlSyhCdH5Ouxq1pbdo1urWtUdU2fnauDOdQr8KrtPNAn7zQgqqKCazqBFrxbQAOuQzrzC9VYTZ8Uov1QPxF0qtbgaek8nX1aA_QFaqtdYzrd9rv5m22Csa1qOveqQYv9Ek_JQakqhLNtPyGv47v5aBJMZ_cPo9tpoIRgbWCSQqaZ0ZEQ0pSZESxmQqtYp5pLyXnJo6IwTIOMWVKAgsxIwXmUlWlsDGhxQi43uSvv3jvANq8taqgq9ftOzgVPRdRX0qPDDaq9Q_RQ5itva-XXecjyH_P5xny-Nd8fXGyzu6IGs8P_VPfA1QboD_Ol63xvG_9L-wYro5Gr</recordid><startdate>20200115</startdate><enddate>20200115</enddate><creator>Tak, Young Jun</creator><creator>Keene, Scott Tom</creator><creator>Kang, Byung Ha</creator><creator>Kim, Won-Gi</creator><creator>Kim, Si Joon</creator><creator>Salleo, Alberto</creator><creator>Kim, Hyun Jae</creator><general>American Chemical Society</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0001-9191-9079</orcidid><orcidid>https://orcid.org/0000-0002-6635-670X</orcidid><orcidid>https://orcid.org/0000-0002-6879-9256</orcidid></search><sort><creationdate>20200115</creationdate><title>Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors</title><author>Tak, Young Jun ; Keene, Scott Tom ; Kang, Byung Ha ; Kim, Won-Gi ; Kim, Si Joon ; Salleo, Alberto ; Kim, Hyun Jae</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a330t-d7b589dc4335df9d30603ca6c8c25522f24bbd0ce5607beae9d532249f86ddec3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tak, Young Jun</creatorcontrib><creatorcontrib>Keene, Scott Tom</creatorcontrib><creatorcontrib>Kang, Byung Ha</creatorcontrib><creatorcontrib>Kim, Won-Gi</creatorcontrib><creatorcontrib>Kim, Si Joon</creatorcontrib><creatorcontrib>Salleo, Alberto</creatorcontrib><creatorcontrib>Kim, Hyun Jae</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>ACS applied materials &amp; interfaces</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tak, Young Jun</au><au>Keene, Scott Tom</au><au>Kang, Byung Ha</au><au>Kim, Won-Gi</au><au>Kim, Si Joon</au><au>Salleo, Alberto</au><au>Kim, Hyun Jae</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors</atitle><jtitle>ACS applied materials &amp; interfaces</jtitle><addtitle>ACS Appl. Mater. Interfaces</addtitle><date>2020-01-15</date><risdate>2020</risdate><volume>12</volume><issue>2</issue><spage>2615</spage><epage>2624</epage><pages>2615-2624</pages><issn>1944-8244</issn><eissn>1944-8252</eissn><abstract>In recent decades, oxide thin-film transistors (TFTs) have attracted a great deal of attention as a promising technology in terms of next-generation electronics due to their outstanding electrical performance. However, achieving robust electrical characteristics under various environments is a crucial challenge for successful realization of oxide-based electronic applications. To resolve the limitation, we propose a highly flexible and reliable heterogeneous organic passivation layer composed of stacked parylene-C and diketopyrrolopyrrole-polymer films for improving stability of oxide TFTs under various environments and mechanical stress. The presented multifunctional heterogeneous organic (MHO) passivation leads to high-performance oxide TFTs by: (1) improving their electrical characteristics, (2) protecting them from external reactive molecules, and (3) blocking light exposure to the oxide layer. As a result, oxide TFTs with MHO passivation exhibit outstanding stability in ambient air as well as under light illumination: the threshold voltage shift of the device is almost 0 V under severe negative bias illumination stress condition (white light of 5700 lx, gate voltage of −20 V, and drain voltage of 10.1 V for 20 000 s). Furthermore, since the MHO passivation layer exhibits high mechanical stability at a bending radius of ≤5 mm and can be deposited at room temperature, this technique is expected to be useful in the fabrication of flexible/wearable devices.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>31850727</pmid><doi>10.1021/acsami.9b16898</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0001-9191-9079</orcidid><orcidid>https://orcid.org/0000-0002-6635-670X</orcidid><orcidid>https://orcid.org/0000-0002-6879-9256</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 1944-8244
ispartof ACS applied materials & interfaces, 2020-01, Vol.12 (2), p.2615-2624
issn 1944-8244
1944-8252
language eng
recordid cdi_proquest_miscellaneous_2328348347
source ACS Publications
title Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T18%3A45%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Multifunctional,%20Room-Temperature%20Processable,%20Heterogeneous%20Organic%20Passivation%20Layer%20for%20Oxide%20Semiconductor%20Thin-Film%20Transistors&rft.jtitle=ACS%20applied%20materials%20&%20interfaces&rft.au=Tak,%20Young%20Jun&rft.date=2020-01-15&rft.volume=12&rft.issue=2&rft.spage=2615&rft.epage=2624&rft.pages=2615-2624&rft.issn=1944-8244&rft.eissn=1944-8252&rft_id=info:doi/10.1021/acsami.9b16898&rft_dat=%3Cproquest_cross%3E2328348347%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2328348347&rft_id=info:pmid/31850727&rfr_iscdi=true