The behavior of nitrogen excited in an inductively coupled argon plasma

An inductively coupled argon plasma, working at atmospherique pressure, was used as an excitation source for nitrogen gas. Excitation of atomic lines of N and of molecular bands of N 2 and N + 2 were observed. Two lines (389.2 and 388.8 nm) which were not previously described, are attributed to atom...

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Veröffentlicht in:Journal of quantitative spectroscopy & radiative transfer 1978, Vol.19 (1), p.83-91
Hauptverfasser: Abdallah, M.H., Mermet, J.M.
Format: Artikel
Sprache:eng
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Zusammenfassung:An inductively coupled argon plasma, working at atmospherique pressure, was used as an excitation source for nitrogen gas. Excitation of atomic lines of N and of molecular bands of N 2 and N + 2 were observed. Two lines (389.2 and 388.8 nm) which were not previously described, are attributed to atomic nitrogen. Using the first negative system of N + 2, several temperature-measurement methods were used according to the resolving power of the monochromator. Good agreement is found between the rotational (4500–5000 K) and excitation temperatures (4500–5100 K) of elements injected into the plasma.
ISSN:0022-4073
1879-1352
DOI:10.1016/0022-4073(78)90042-0