Electronic properties of amorphous silicon selenium films
The presence of selenium in amorphous silicon films increases the optical gap from 1.25 to 1.8 eV. At the same time, the room-temperature resistivity increases by four orders of magnitude and thermal activation energy increases from 0.16 to 0.76 and 0.41 eV for the high and low-temperature regions,...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 1983-03, Vol.42 (6), p.523-524 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The presence of selenium in amorphous silicon films increases the optical gap from 1.25 to 1.8 eV. At the same time, the room-temperature resistivity increases by four orders of magnitude and thermal activation energy increases from 0.16 to 0.76 and 0.41 eV for the high and low-temperature regions, respectively. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.93991 |