Thulium-doped tellurium oxide waveguide amplifier with 76  dB net gain on a silicon nitride chip

We report on thulium-doped waveguide amplifiers integrated on a low-loss silicon nitride platform. The amplifier structure consists of a thulium-doped tellurium oxide thin film coated on a silicon nitride strip waveguide on silicon. We determine a waveguide background loss of 0.7 dB/cm at 1479 nm ba...

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Veröffentlicht in:Optics letters 2019-12, Vol.44 (23), p.5788-5791
Hauptverfasser: Kiani, Khadijeh Miarabbas, Frankis, Henry C., Mbonde, Hamidu M., Mateman, Richard, Leinse, Arne, Knights, Andrew P., Bradley, Jonathan D. B.
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Sprache:eng
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Zusammenfassung:We report on thulium-doped waveguide amplifiers integrated on a low-loss silicon nitride platform. The amplifier structure consists of a thulium-doped tellurium oxide thin film coated on a silicon nitride strip waveguide on silicon. We determine a waveguide background loss of 0.7 dB/cm at 1479 nm based on the quality factor measured in microring resonators. Gain measurements were carried out in straight and 6.7-cm-long s-bend waveguides realized on a 2.2-cm-long chip. We measure internal net gain over the wavelength range 1860–2000 nm under 1620 nm pumping and up to 7.6 dB total gain at 1870 nm, corresponding to 1.1 dB/cm. These results are promising for the realization of highly compact thulium-doped amplifiers in the emerging 2 μm band for silicon-based photonic microsystems.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.44.005788