Channel-length effects in quarter-micrometer gate-length GaAs MESFET's

The electrical performance of 0.25-µm gate-length GaAs MESFET's with channel lengths (i.e., source-drain spacings) of 2.1 and 0.5µm is compared. An extremely short channel length has been found experimentally to lead to significant increases in the electron average drift velocity, transconducta...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE electron device letters 1983-09, Vol.4 (9), p.326-328
Hauptverfasser: Chao, P.C., Smith, P.M., Wanuga, S., Perkins, W.H., Wolf, E.D.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The electrical performance of 0.25-µm gate-length GaAs MESFET's with channel lengths (i.e., source-drain spacings) of 2.1 and 0.5µm is compared. An extremely short channel length has been found experimentally to lead to significant increases in the electron average drift velocity, transconductance, and forward transducer gain. Increases in both the electron average drift velocity and intrinsic dc transconductance of ∼70 percent were observed in these 0.25-µm gate-length devices when the source-drain spacing was reduced from 2.1 to 0.5µm. Deleterious effects such as increased output conductance and interelectrode capacitances were also noted.
ISSN:0741-3106
1558-0563
DOI:10.1109/EDL.1983.25750