Vapour-phase deposition of oriented copper dicarboxylate metal-organic framework thin films

Vapour-phase deposition of oriented copper dicarboxylate metal-organic framework thin films

Copper dicarboxylate metal-organic framework films are deposited via chemical vapour deposition. Uniform films of CuBDC and CuCDC with an out-of-plane orientation and accessible porosity are obtained from the reaction of Cu and CuO with vaporised dicarboxylic acid linkers. Vapour-phase deposition of...

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Veröffentlicht in:Chemical communications (Cambridge, England) England), 2019-09, Vol.55 (68), p.156-159
Hauptverfasser: Stassin, Timothée, Rodríguez-Hermida, Sabina, Schrode, Benedikt, Cruz, Alexander John, Carraro, Francesco, Kravchenko, Dmitry, Creemers, Vincent, Stassen, Ivo, Hauffman, Tom, De Vos, Dirk, Falcaro, Paolo, Resel, Roland, Ameloot, Rob
Format: Artikel
Sprache:eng
Schlagworte:
Chemical vapor deposition
Copper
Copper oxides
Crystals
Dicarboxylic acids
Ellipsometry
Film thickness
Metal-organic frameworks
Organic chemistry
Porosity
Thermogravimetric analysis
Thin films
X ray photoelectron spectroscopy
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Zusammenfassung:Copper dicarboxylate metal-organic framework films are deposited via chemical vapour deposition. Uniform films of CuBDC and CuCDC with an out-of-plane orientation and accessible porosity are obtained from the reaction of Cu and CuO with vaporised dicarboxylic acid linkers. Vapour-phase deposition of copper dicarboxylate metal-organic framework thin films with an out-of-plane orientation and accessible porosity.
ISSN:1359-7345
1364-548X
DOI:10.1039/c9cc05161a