Complex Reagents For The Removal And Inhibition Of Paraffin Deposition For Highly Paraffinic Oil Production And Transportation
The chemical-radiation modification of atactic polypropylene can create a new chemical reagent of complex action OAPP-V/200. The structure and phase composition of the reagent was proved by using IR-spectroscopy and X-ray analysis. It was determined that the reagent has a high degree of amorphizatio...
Gespeichert in:
Veröffentlicht in: | WIT Transactions on Ecology and the Environment 2015-01, Vol.186, p.669 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The chemical-radiation modification of atactic polypropylene can create a new chemical reagent of complex action OAPP-V/200. The structure and phase composition of the reagent was proved by using IR-spectroscopy and X-ray analysis. It was determined that the reagent has a high degree of amorphization - 65%. On the basis of this reagent, we created a new composition for inhibiting the dissolution of paraffin deposition. As a solvent, a mixture of aromatic and unsaturated hydrocarbons were used. The paraffin deposition inhibiting ability of the reagent was tested on the highly paraffinic oil of fields Kumkol and Akshabulak. It was revealed that the inhibition efficiency of the reagent may reach up to 80%. It was also was found that the solvent compound of composition is influenced by inhibition efficiency; it increases with a rise in unsaturated hydrocarbon molecular mass. The composite mixture based on OAPP-V/200 was tested as a solvent for paraffin deposition at the Kumkol oil field. The results demonstrated that the composition with the highest content of unsaturated hydrocarbons proved to have the best solubility. Under stationary conditions of the experiment, at low temperatures, paraffin deposition dissolution efficiency reached above 70% within 6 hours. The results of this research show that the unsaturated solvents have good penetration in formed paraffin deposition, contributing to their destruction. |
---|---|
ISSN: | 1746-448X 1743-3541 |
DOI: | 10.2495/ESUS140591 |