CMOS-Integrated Low-Noise Junction Field-Effect Transistors for Bioelectronic Applications

In this letter, we present a CMOS-integrated low noise junction field-effect transistor (JFET) developed in a standard 0.18 μm CMOS process. These JFETs reduce input referred flicker noise power by more than a factor of 10 when compared with equally sized n-channel MOS devices by eliminating oxide i...

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Veröffentlicht in:IEEE electron device letters 2018-07, Vol.39 (7), p.931-934
Hauptverfasser: Fleischer, Daniel A., Shekar, Siddharth, Dai, Shanshan, Field, Ryan M., Lary, Jenifer, Rosenstein, Jacob K., Shepard, Kenneth L.
Format: Artikel
Sprache:eng
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Zusammenfassung:In this letter, we present a CMOS-integrated low noise junction field-effect transistor (JFET) developed in a standard 0.18 μm CMOS process. These JFETs reduce input referred flicker noise power by more than a factor of 10 when compared with equally sized n-channel MOS devices by eliminating oxide interfaces in contact with the channel. We show that this improvement in device performance translates into a factor-of-10 reduction in the input-referred noise of integrated CMOS operational amplifiers when JFET devices are used at the input, significant for many applications in bioelectronics.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2018.2844545