Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist

Organotin photoresists have shown promise for next-generation lithography because of their high extreme ultraviolet (EUV) absorption cross sections, their radiation sensitive chemistries, and their ability to enable high-resolution patterning. To better understand both temperature- and radiation-ind...

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Veröffentlicht in:	ACS applied materials & interfaces 2019-01, Vol.11 (4), p.4514-4522
Hauptverfasser:	Frederick, Ryan T, Diulus, J. Trey, Hutchison, Danielle C, Nyman, May, Herman, Gregory S
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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