Characterization of low-shrinkage dental composites containing methacrylethyl-polyhedral oligomeric silsesquioxane (ME-POSS)

The aim of this study was to characterize low-shrinkage dental composites containing methacrylethyl-polyhedral oligomeric silsesquioxane (ME-POSS). Four experimental composites were manufactured, two of which contained organic matrixes of BisGMA-TEGDMA (70/30 wt% - BGC) and BisEMA-TEGDMA (80/20 wt%...

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Veröffentlicht in:Journal of the mechanical behavior of biomedical materials 2019-02, Vol.90, p.566-574
Hauptverfasser: Canellas, Talita Angelina Tavares, de Almeida Neves, Aline, Dos Santos, Ingrid Kimberly Bezerra, de Rezende, Amanda Ramos Pereira, Fellows, Carlos Eduardo, da Silva, Eduardo Moreira
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Sprache:eng
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Zusammenfassung:The aim of this study was to characterize low-shrinkage dental composites containing methacrylethyl-polyhedral oligomeric silsesquioxane (ME-POSS). Four experimental composites were manufactured, two of which contained organic matrixes of BisGMA-TEGDMA (70/30 wt% - BGC) and BisEMA-TEGDMA (80/20 wt% - BEC). The two other experimental composites replaced BisGMA and BisEMA with 25 wt% of ME-POSS (BGP and BEP). The composites also contained 70 wt% of 0.7 µm silanized BaBSi particles. The following properties were evaluated: Degree of conversion (DC%), volumetric polymerization shrinkage (VS%), polymerization shrinkage stress (Pss), flexural strength (FS), Flexural modulus (FM), hardness (KHN), water sorption (W ), water solubility (W ), diffusion coefficient (D), and wear. The DC% was not influenced by the presence of ME-POSS, with BEC (75.6%) and BEP (74.8%) presenting higher DC% than BGC (60.6%) and BGP (55.6%). The ME-POSS-containing composites (BGP and BEP) presented significantly lower VS% and Pss. The FS ranged from 92.7 to 142.0 MPa and the FM from 3.6 to 10.3 GPa. ME-POSS did not influence the KHN. BEC and BEP presented lower W and W when compared to BGC and BGP. D ranged from 1.0 × 10 to 7.4 × 10 cm m . Incorporation of ME-POSS significantly decreased the wear for both binary matrices (p 
ISSN:1751-6161
1878-0180
DOI:10.1016/j.jmbbm.2018.10.028