Ultrahigh‐vacuum organic molecular‐beam deposition system for in situ growth and characterization

A compact ultrahigh‐vacuum molecular‐beam deposition system has been developed for the in situ synthesis of organic thin films and multilayers. The system incorporates all the features (heater, thickness monitor, evaporators) necessary for controlled organic thin‐film growth. It can be used independently, or it can be docked to the in situ growth system and transferred to other instruments of the PGM beamline, thus allowing extensive film preparation and characterization. A manipulator dedicated to specimen preparation and organic‐film deposition with temperature control between 200 K and ∼800 K has been developed. The design and performance of the system are reported with emphasis on a novel solution of masks developed to achieve position‐dependent film deposition. To demonstrate the enhanced capabilities of the PGM beamline in the growth and in the characterization of electronic‐structure studies of organic molecular films and their heterostructures through synchrotron‐based spectroscopies, this paper presents some preliminary results of a study of Fe‐phthalocyanine growth on Si substrates and on in situ prepared La0.67Sr0.33MnO3 buffer layers on SrTiO3 single crystal. A compact ultrahigh‐vacuum molecular‐beam deposition system has been developed for the in situ synthesis of organic thin films and multilayers. The system incorporates all the features necessary for controlled organic thin‐film growth.