Compositionally controlled plasmonics in amorphous semiconductor metasurfaces

Amorphous bismuth telluride (Bi:Te) provides a composition-dependent, CMOS-compatible alternative material platform for plasmonics in the ultraviolet-visible spectral range. Thin films of the chalcogenide semiconductor are found, using high-throughput physical vapor deposition and characterization t...

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Veröffentlicht in:Optics express 2018-08, Vol.26 (16), p.20861-20867
Hauptverfasser: Piccinotti, Davide, Gholipour, Behrad, Yao, Jin, Macdonald, Kevin F, Hayden, Brian E, Zheludev, Nikolay I
Format: Artikel
Sprache:eng
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Zusammenfassung:Amorphous bismuth telluride (Bi:Te) provides a composition-dependent, CMOS-compatible alternative material platform for plasmonics in the ultraviolet-visible spectral range. Thin films of the chalcogenide semiconductor are found, using high-throughput physical vapor deposition and characterization techniques, to exhibit a plasmonic response (a negative value of the real part of relative permittivity) over a band of wavelengths extending from ~250 nm to between 530 and 978 nm, depending on alloy composition (Bi:Te at% ratio). The plasmonic response is illustrated via the fabrication of subwavelength period nano-grating metasurfaces, which present strong, period-dependent plasmonic absorption resonances in the visible range, manifested in the perceived color of the nanostructured domains in reflection.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.26.020861