Reflective EUVL tool design with generalized Gaussian constant mathematics
This study aims to develop a systematic design procedure for extreme ultraviolet lithography tools. Through analysis using generalized Gaussian constants, relationships between optical properties and requirements can be obtained, and can be used to help ensure that optical system properties required...
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| Veröffentlicht in: | Applied optics (2004) 2018-07, Vol.57 (20), p.5884-5892 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | This study aims to develop a systematic design procedure for extreme ultraviolet lithography tools. Through analysis using generalized Gaussian constants, relationships between optical properties and requirements can be obtained, and can be used to help ensure that optical system properties required for the tool are upheld during the design process. As verification of the design method, an eight-mirror 0.4 NA tool design has been demonstrated. |
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| ISSN: | 1559-128X 2155-3165 1539-4522 |
| DOI: | 10.1364/AO.57.005884 |