Fabrication of blue-light emission fused-silica substrates by using Si-ion implantation and high-temperature annealing

Fabrication of blue-light emission fused-silica substrates by using Si-ion implantation and high-temperature annealing

We fabricated fused-silica substrates which emit blue light by using Si-ion implantation and high-temperature annealing. Photoluminescence peak wavelengths are around 400 nm, and the peak intensities can be remarkable after annealing above 1150 °C.

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Bibliographische Detailangaben
Veröffentlicht in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2007-10, Vol.263 (2), p.532-534
Hauptverfasser: Miura, Kenta, Tanemura, Takeshi, Hanaizumi, Osamu, Yamamoto, Shunya, Takano, Katsuyoshi, Sugimoto, Masaki, Yoshikawa, Masahito
Format: Artikel
Sprache:eng
Schlagworte:
Annealing
Blue-light emission
Ion implantation
Silica
Silicon
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Beschreibung
Zusammenfassung:We fabricated fused-silica substrates which emit blue light by using Si-ion implantation and high-temperature annealing. Photoluminescence peak wavelengths are around 400 nm, and the peak intensities can be remarkable after annealing above 1150 °C.
ISSN:0168-583X
1872-9584
DOI:10.1016/j.nimb.2007.07.008