N sub(2)O removal in N sub(2) or air by ArF excimer laser photolysis at atmospheric pressure

A photochemical process is proposed as a new efficient N sub(2)O removal technique in N sub(2) or air at atmospheric pressure and room temperature without using any catalysts. N sub(2)O diluted in N sub(2) or air was decomposed into N sub(2), O sub(2), and NO by using a 193 nm ArF excimer laser. The...

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Veröffentlicht in:Journal of hazardous materials 2004-05, Vol.108 (3), p.189-197
Hauptverfasser: Tsuji, M, Kumagae, J, Tsuji, T, Hamagami, T
Format: Artikel
Sprache:eng
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Zusammenfassung:A photochemical process is proposed as a new efficient N sub(2)O removal technique in N sub(2) or air at atmospheric pressure and room temperature without using any catalysts. N sub(2)O diluted in N sub(2) or air was decomposed into N sub(2), O sub(2), and NO by using a 193 nm ArF excimer laser. The maximum conversion of N sub(2)O in N sub(2)O/N sub(2) or N sub(2)O/N sub(2)/O sub(2) mixtures was 93% at a laser power of 136 mJ, a repetition frequency of 5 Hz, and an irradiation time of 30 min. The formation ratios of N sub(2):O sub(2):NO in N sub(2)O/N sub(2) and N sub(2)O/N sub(2)/O sub(2) mixtures were 64:31:5.1% and 60:27:13%, respectively. The decomposition mechanism of N sub(2)O under 193 nm photolysis was discussed by comparing experimental data with calculated model using known photochemical and gas kinetic data.
ISSN:0304-3894
DOI:10.1016/j.jhazmat.2004.02.024