N sub(2)O removal in N sub(2) or air by ArF excimer laser photolysis at atmospheric pressure
A photochemical process is proposed as a new efficient N sub(2)O removal technique in N sub(2) or air at atmospheric pressure and room temperature without using any catalysts. N sub(2)O diluted in N sub(2) or air was decomposed into N sub(2), O sub(2), and NO by using a 193 nm ArF excimer laser. The...
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Veröffentlicht in: | Journal of hazardous materials 2004-05, Vol.108 (3), p.189-197 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A photochemical process is proposed as a new efficient N sub(2)O removal technique in N sub(2) or air at atmospheric pressure and room temperature without using any catalysts. N sub(2)O diluted in N sub(2) or air was decomposed into N sub(2), O sub(2), and NO by using a 193 nm ArF excimer laser. The maximum conversion of N sub(2)O in N sub(2)O/N sub(2) or N sub(2)O/N sub(2)/O sub(2) mixtures was 93% at a laser power of 136 mJ, a repetition frequency of 5 Hz, and an irradiation time of 30 min. The formation ratios of N sub(2):O sub(2):NO in N sub(2)O/N sub(2) and N sub(2)O/N sub(2)/O sub(2) mixtures were 64:31:5.1% and 60:27:13%, respectively. The decomposition mechanism of N sub(2)O under 193 nm photolysis was discussed by comparing experimental data with calculated model using known photochemical and gas kinetic data. |
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ISSN: | 0304-3894 |
DOI: | 10.1016/j.jhazmat.2004.02.024 |