Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence
Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the lin...
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| Veröffentlicht in: | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2008-11, Vol.266 (21), p.4762-4765 |
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| container_end_page | 4765 |
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| container_issue | 21 |
| container_start_page | 4762 |
| container_title | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms |
| container_volume | 266 |
| creator | Yu, Seung-Jun Ohki, Yoshimichi Fujimaki, Makoto Awazu, Koichi Tominaga, Junji Sasa, Kimikazu Komatsubara, Tetsuro |
| description | Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7
dB was obtained, indicating that the method is effective for reducing polarization dependent loss. |
| doi_str_mv | 10.1016/j.nimb.2008.07.027 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_19493124</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0168583X0800918X</els_id><sourcerecordid>19493124</sourcerecordid><originalsourceid>FETCH-LOGICAL-c397t-678dc85a64c9966d18b754c561c639ae598d69ec1d0290b3c54fed2b31a147fd3</originalsourceid><addsrcrecordid>eNp9kE9LxDAQxYMouK5-AU85eWtN2qZNwIss_oMFQRS8hTSZrlnatCatsn56013PzmUY-L3HvIfQJSUpJbS83qbOdnWaEcJTUqUkq47QgvIqSwTjxTFaRIgnjOfvp-gshC2Jw3K2QMMLmEmPtnfYOjz0rfL2R-1vAwM4A27EbR8C7hus8NAqpzxu7eZj_FZfgLX1erIjrnc4ahLbzcS4N0isi9ZgcG09NN66DTgN5-ikUW2Ai7-9RG_3d6-rx2T9_PC0ul0nOhfVmJQVN5ozVRZaiLI0lNcVKzQrqS5zoYAJbkoBmhqSCVLnmhUNmKzOqaJF1Zh8ia4OvoPvPycIo-xs0NDG96CfgqSiEDnNighmB1D7GDN-KgdvO-V3khI5lyu3ci5XzuVKUslYbhTdHEQQI3xZ8DJoO8czMasepentf_JfPvWFzQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>19493124</pqid></control><display><type>article</type><title>Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence</title><source>Elsevier ScienceDirect Journals Complete - AutoHoldings</source><creator>Yu, Seung-Jun ; Ohki, Yoshimichi ; Fujimaki, Makoto ; Awazu, Koichi ; Tominaga, Junji ; Sasa, Kimikazu ; Komatsubara, Tetsuro</creator><creatorcontrib>Yu, Seung-Jun ; Ohki, Yoshimichi ; Fujimaki, Makoto ; Awazu, Koichi ; Tominaga, Junji ; Sasa, Kimikazu ; Komatsubara, Tetsuro</creatorcontrib><description>Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7
dB was obtained, indicating that the method is effective for reducing polarization dependent loss.</description><identifier>ISSN: 0168-583X</identifier><identifier>EISSN: 1872-9584</identifier><identifier>DOI: 10.1016/j.nimb.2008.07.027</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Birefringence ; Ion implantation ; Planar lightwave circuit ; Polarization dependent loss</subject><ispartof>Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2008-11, Vol.266 (21), p.4762-4765</ispartof><rights>2008 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c397t-678dc85a64c9966d18b754c561c639ae598d69ec1d0290b3c54fed2b31a147fd3</citedby><cites>FETCH-LOGICAL-c397t-678dc85a64c9966d18b754c561c639ae598d69ec1d0290b3c54fed2b31a147fd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.nimb.2008.07.027$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3548,27922,27923,45993</link.rule.ids></links><search><creatorcontrib>Yu, Seung-Jun</creatorcontrib><creatorcontrib>Ohki, Yoshimichi</creatorcontrib><creatorcontrib>Fujimaki, Makoto</creatorcontrib><creatorcontrib>Awazu, Koichi</creatorcontrib><creatorcontrib>Tominaga, Junji</creatorcontrib><creatorcontrib>Sasa, Kimikazu</creatorcontrib><creatorcontrib>Komatsubara, Tetsuro</creatorcontrib><title>Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence</title><title>Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms</title><description>Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7
dB was obtained, indicating that the method is effective for reducing polarization dependent loss.</description><subject>Birefringence</subject><subject>Ion implantation</subject><subject>Planar lightwave circuit</subject><subject>Polarization dependent loss</subject><issn>0168-583X</issn><issn>1872-9584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp9kE9LxDAQxYMouK5-AU85eWtN2qZNwIss_oMFQRS8hTSZrlnatCatsn56013PzmUY-L3HvIfQJSUpJbS83qbOdnWaEcJTUqUkq47QgvIqSwTjxTFaRIgnjOfvp-gshC2Jw3K2QMMLmEmPtnfYOjz0rfL2R-1vAwM4A27EbR8C7hus8NAqpzxu7eZj_FZfgLX1erIjrnc4ahLbzcS4N0isi9ZgcG09NN66DTgN5-ikUW2Ai7-9RG_3d6-rx2T9_PC0ul0nOhfVmJQVN5ozVRZaiLI0lNcVKzQrqS5zoYAJbkoBmhqSCVLnmhUNmKzOqaJF1Zh8ia4OvoPvPycIo-xs0NDG96CfgqSiEDnNighmB1D7GDN-KgdvO-V3khI5lyu3ci5XzuVKUslYbhTdHEQQI3xZ8DJoO8czMasepentf_JfPvWFzQ</recordid><startdate>20081101</startdate><enddate>20081101</enddate><creator>Yu, Seung-Jun</creator><creator>Ohki, Yoshimichi</creator><creator>Fujimaki, Makoto</creator><creator>Awazu, Koichi</creator><creator>Tominaga, Junji</creator><creator>Sasa, Kimikazu</creator><creator>Komatsubara, Tetsuro</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QO</scope><scope>8FD</scope><scope>FR3</scope><scope>P64</scope></search><sort><creationdate>20081101</creationdate><title>Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence</title><author>Yu, Seung-Jun ; Ohki, Yoshimichi ; Fujimaki, Makoto ; Awazu, Koichi ; Tominaga, Junji ; Sasa, Kimikazu ; Komatsubara, Tetsuro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c397t-678dc85a64c9966d18b754c561c639ae598d69ec1d0290b3c54fed2b31a147fd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Birefringence</topic><topic>Ion implantation</topic><topic>Planar lightwave circuit</topic><topic>Polarization dependent loss</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yu, Seung-Jun</creatorcontrib><creatorcontrib>Ohki, Yoshimichi</creatorcontrib><creatorcontrib>Fujimaki, Makoto</creatorcontrib><creatorcontrib>Awazu, Koichi</creatorcontrib><creatorcontrib>Tominaga, Junji</creatorcontrib><creatorcontrib>Sasa, Kimikazu</creatorcontrib><creatorcontrib>Komatsubara, Tetsuro</creatorcontrib><collection>CrossRef</collection><collection>Biotechnology Research Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Biotechnology and BioEngineering Abstracts</collection><jtitle>Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yu, Seung-Jun</au><au>Ohki, Yoshimichi</au><au>Fujimaki, Makoto</au><au>Awazu, Koichi</au><au>Tominaga, Junji</au><au>Sasa, Kimikazu</au><au>Komatsubara, Tetsuro</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence</atitle><jtitle>Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms</jtitle><date>2008-11-01</date><risdate>2008</risdate><volume>266</volume><issue>21</issue><spage>4762</spage><epage>4765</epage><pages>4762-4765</pages><issn>0168-583X</issn><eissn>1872-9584</eissn><abstract>Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7
dB was obtained, indicating that the method is effective for reducing polarization dependent loss.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.nimb.2008.07.027</doi><tpages>4</tpages></addata></record> |
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| ispartof | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2008-11, Vol.266 (21), p.4762-4765 |
| issn | 0168-583X 1872-9584 |
| language | eng |
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| source | Elsevier ScienceDirect Journals Complete - AutoHoldings |
| subjects | Birefringence Ion implantation Planar lightwave circuit Polarization dependent loss |
| title | Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T16%3A18%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Reduction%20in%20polarization%20dependent%20loss%20of%20a%20planar%20lightwave%20circuit%20by%20ion-implantation-induced%20birefringence&rft.jtitle=Nuclear%20instruments%20&%20methods%20in%20physics%20research.%20Section%20B,%20Beam%20interactions%20with%20materials%20and%20atoms&rft.au=Yu,%20Seung-Jun&rft.date=2008-11-01&rft.volume=266&rft.issue=21&rft.spage=4762&rft.epage=4765&rft.pages=4762-4765&rft.issn=0168-583X&rft.eissn=1872-9584&rft_id=info:doi/10.1016/j.nimb.2008.07.027&rft_dat=%3Cproquest_cross%3E19493124%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=19493124&rft_id=info:pmid/&rft_els_id=S0168583X0800918X&rfr_iscdi=true |