Modeling Mechanochemical Reaction Mechanisms

The mechanochemical reaction between copper and dimethyl disulfide is studied under well-controlled conditions in ultrahigh vacuum (UHV). Reaction is initiated by fast S–S bond scission to form adsorbed methyl thiolate species, and the reaction kinetics are reproduced by two subsequent elementary me...

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Veröffentlicht in:ACS applied materials & interfaces 2017-08, Vol.9 (31), p.26531-26538
Hauptverfasser: Adams, Heather, Miller, Brendan P, Furlong, Octavio J, Fantauzzi, Marzia, Navarra, Gabriele, Rossi, Antonella, Xu, Yufu, Kotvis, Peter V, Tysoe, Wilfred T
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Sprache:eng
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Zusammenfassung:The mechanochemical reaction between copper and dimethyl disulfide is studied under well-controlled conditions in ultrahigh vacuum (UHV). Reaction is initiated by fast S–S bond scission to form adsorbed methyl thiolate species, and the reaction kinetics are reproduced by two subsequent elementary mechanochemical reaction steps, namely a mechanochemical decomposition of methyl thiolate to deposit sulfur on the surface and evolve small, gas-phase hydrocarbons, and sliding-induced oxidation of the copper by sulfur that regenerates vacant reaction sites. The steady-state reaction kinetics are monitored in situ from the variation in the friction force as the reaction proceeds and modeled using the elementary-step reaction rate constants found for monolayer adsorbates. The analysis yields excellent agreement between the experiment and the kinetic model, as well as correctly predicting the total amount of subsurface sulfur in the film measured using Auger spectroscopy and the sulfur depth distribution measured by angle-resolved X-ray photoelectron spectroscopy.
ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.7b05440