Simultaneous topographical, electrical and optical microscopy of optoelectronic devices at the nanoscale

Novel optoelectronic devices rely on complex nanomaterial systems where the nanoscale morphology and local chemical composition are critical to performance. However, the lack of analytical techniques that can directly probe these structure-property relationships at the nanoscale presents a major obs...

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Veröffentlicht in:Nanoscale 2017-02, Vol.9 (8), p.2723-2731
Hauptverfasser: Kumar, Naresh, Zoladek-Lemanczyk, Alina, Guilbert, Anne A Y, Su, Weitao, Tuladhar, Sachetan M, Kirchartz, Thomas, Schroeder, Bob C, McCulloch, Iain, Nelson, Jenny, Roy, Debdulal, Castro, Fernando A
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Sprache:eng
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Zusammenfassung:Novel optoelectronic devices rely on complex nanomaterial systems where the nanoscale morphology and local chemical composition are critical to performance. However, the lack of analytical techniques that can directly probe these structure-property relationships at the nanoscale presents a major obstacle to device development. In this work, we present a novel method for non-destructive, simultaneous mapping of the morphology, chemical composition and photoelectrical properties with
ISSN:2040-3364
2040-3372
DOI:10.1039/c6nr09057e