Design and fabrication of transmission quarter phase retarder at wavelength 1064 nm, using optical nanometric thin films

We designed and fabricated the transmission quarter-wave plate phase retarder at 1064 nm using optical nanometric thin films of silicon oxide and titanium oxide. Final design consists of 32 layers. Transmissions of polarizations are equal and ≥99 % and their phase difference is 90°. System consists of two 16 layers systems that coated with the same condition on BK7 glass substrates then attached together with optical glue. Electron beam evaporation method was used for depositing materials. Photo spectrometer was used for measuring transmission spectrum of system. Transmission of polarizations was ≥95 % and equal. A polarimeter was used for testing systems. Polarization of beam was circular.