Dihydrogen Splitting Using Dialkylsilylene‐Based Frustrated Lewis Pairs
Isolable dialkylsilylene 5 reacts with dihydrogen in the presence of a small amount of a conventional Lewis acid (BPh3, BEt3) or a base (PPh3, PEt3, NPh3, NEt3) at low temperatures in a hydrocarbon solvent, giving the corresponding dihydrosilane 10 in high yields. Both 5/Lewis acid and Lewis base/5...
Gespeichert in:
Veröffentlicht in: | Chemistry, an Asian journal an Asian journal, 2017-06, Vol.12 (11), p.1204-1207 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Isolable dialkylsilylene 5 reacts with dihydrogen in the presence of a small amount of a conventional Lewis acid (BPh3, BEt3) or a base (PPh3, PEt3, NPh3, NEt3) at low temperatures in a hydrocarbon solvent, giving the corresponding dihydrosilane 10 in high yields. Both 5/Lewis acid and Lewis base/5 pairs work as a frustrated Lewis pair (FLP) to split dihydrogen, being in accord with the amphoteric nature of silylene 5.
Splitting up based on frustration: Amphoteric dialkylsilylene 5 that forms frustrated Lewis pairs (FLPs) with either a Lewis acid or base splits dihydrogen at low temperatures in hexane giving the corresponding dihydrosilane 10 in high yields. |
---|---|
ISSN: | 1861-4728 1861-471X |
DOI: | 10.1002/asia.201700143 |