I-V characteristics of microwave-driven Josephson junctions in the low-frequency and high-damping regime

Experimental I-V curves of microwave-driven Josephson tunnel junctions with resistive shunts are reported. The results are in very good agreement with numerical calculations using the resistively shunted junction model. In the low-frequency regime there are three distinct regions in the I-V curves a...

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Veröffentlicht in:Phys. Rev. B: Condens. Matter; (United States) 1985-04, Vol.31 (7), p.4230-4233
Hauptverfasser: VANNESTE, C, CHI, C. C, PROTO, G, WANG, R. H, YOGI, T, BROWN, K. H, CALLEGARI, A. C, CHEN, M. M, GREINER, J. H, JONES, H. C, KIM, K. K, KLEINSASSER, A. W, NOTARYS, H. A
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Sprache:eng
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Zusammenfassung:Experimental I-V curves of microwave-driven Josephson tunnel junctions with resistive shunts are reported. The results are in very good agreement with numerical calculations using the resistively shunted junction model. In the low-frequency regime there are three distinct regions in the I-V curves and two different types of Shapiro steps. It is demonstrated that the overall shape of the I-V curves can be explained by using an adiabatic interpretation of the junction response. The two different types of Shapiro steps are related to a compensation effect between dc and rf bias currents.
ISSN:0163-1829
1095-3795
DOI:10.1103/PhysRevB.31.4230