Local-field method for resistivity and electromigration in metallic microstructures: application to thin films
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| Veröffentlicht in: | Physical review. B, Condensed matter Condensed matter, 1988-10, Vol.38 (11), p.7260-7274 |
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| Sprache: | eng |
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| container_end_page | 7274 |
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| container_issue | 11 |
| container_start_page | 7260 |
| container_title | Physical review. B, Condensed matter |
| container_volume | 38 |
| creator | CHU, C. S SORBELLO, R. S |
| description | |
| doi_str_mv | 10.1103/PhysRevB.38.7260 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0163-1829 |
| ispartof | Physical review. B, Condensed matter, 1988-10, Vol.38 (11), p.7260-7274 |
| issn | 0163-1829 1095-3795 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1859225780 |
| source | American Physical Society Journals |
| subjects | Analysing. Testing. Standards Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Measurement of properties and materials state Metals. Metallurgy Nondestructive testing Physics |
| title | Local-field method for resistivity and electromigration in metallic microstructures: application to thin films |
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