In-situ observation of crystal growth and the mechanism

The spatial and time resolution in the measurements of growth rates and the observation of surface morphologies and the associated transport phenomena reflecting their growth mechanism have been developed because advanced microscopes and interferometers have attained nano-scale resolution. The first...

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Veröffentlicht in:Progress in crystal growth and characterization of materials 2016-06, Vol.62 (2), p.111-125
1. Verfasser: Tsukamoto, Katsuo
Format: Artikel
Sprache:eng
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Zusammenfassung:The spatial and time resolution in the measurements of growth rates and the observation of surface morphologies and the associated transport phenomena reflecting their growth mechanism have been developed because advanced microscopes and interferometers have attained nano-scale resolution. The first part covers the historical background how in-situ observation of crystal growth at molecular-level by optical and other scanning methods had been developed for understanding of crystal growth by measuring crystal growth rates and by observing surface nano-topographies, such as growth steps and spiral hillocks, with the same vertical resolutions comparable to that of the scanning probe microscopic techniques. The potential of recently developed interferometric techniques, such as Phase-Shift Interferometry (PSI) is then reviewed with the principle of the optics. Capability of measuring growth rates of crystals as low as 10−5 nm/s (1 µm/year) is introduced. Second part of the article emphasizes basic interferometric technique for the understanding of crystal growth mechanism by measuring growth rate vs supersaturation. Utilization of these techniques not only in fundamental crystal growth fields but also in environmental sciences, space sciences and crystallization in microgravity would briefly be introduced. At the end, we select a few examples how growth mechanism was analyzed based on these kinetic measurements.
ISSN:0960-8974
1878-4208
DOI:10.1016/j.pcrysgrow.2016.04.005