Diamond epitaxy: Basics and applications

Diamond has been used as cutting tools, and also has recently attracted extensive attention as a semiconductor. In the review, its properties and prospects of its electronic devices are shown. Then, principles of crystal growth methods, such as high-pressure, high-temperature (HPHT) and chemical vap...

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Veröffentlicht in:Progress in crystal growth and characterization of materials 2016-06, Vol.62 (2), p.317-328
1. Verfasser: Kasu, Makoto
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container_title Progress in crystal growth and characterization of materials
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creator Kasu, Makoto
description Diamond has been used as cutting tools, and also has recently attracted extensive attention as a semiconductor. In the review, its properties and prospects of its electronic devices are shown. Then, principles of crystal growth methods, such as high-pressure, high-temperature (HPHT) and chemical vapor deposition (CVD) methods, are described. Next, current understanding of defects such as dislocations and stacking faults is described. Further, for the future electronic applications, the present status of wafer technology and impurity doping are described. Finally, the electronic devices made of diamond semiconductors are shown.
doi_str_mv 10.1016/j.pcrysgrow.2016.04.017
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source Elsevier ScienceDirect Journals
subjects Chemical vapor deposition
Crystal defects
Crystal growth
defect
diamond
Diamond machining
Diamond tools
electronic device
Electronic devices
Electronics
growth principle
Semiconductors
title Diamond epitaxy: Basics and applications
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