Diamond epitaxy: Basics and applications
Diamond has been used as cutting tools, and also has recently attracted extensive attention as a semiconductor. In the review, its properties and prospects of its electronic devices are shown. Then, principles of crystal growth methods, such as high-pressure, high-temperature (HPHT) and chemical vap...
Gespeichert in:
Veröffentlicht in: | Progress in crystal growth and characterization of materials 2016-06, Vol.62 (2), p.317-328 |
---|---|
1. Verfasser: | |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Diamond has been used as cutting tools, and also has recently attracted extensive attention as a semiconductor. In the review, its properties and prospects of its electronic devices are shown. Then, principles of crystal growth methods, such as high-pressure, high-temperature (HPHT) and chemical vapor deposition (CVD) methods, are described. Next, current understanding of defects such as dislocations and stacking faults is described. Further, for the future electronic applications, the present status of wafer technology and impurity doping are described. Finally, the electronic devices made of diamond semiconductors are shown. |
---|---|
ISSN: | 0960-8974 1878-4208 |
DOI: | 10.1016/j.pcrysgrow.2016.04.017 |