A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programm...

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Veröffentlicht in:ACS applied materials & interfaces 2017-01, Vol.9 (1), p.22-28
Hauptverfasser: Song, Youngjun, Takahashi, Tsukasa, Kim, Sejung, Heaney, Yvonne C, Warner, John, Chen, Shaochen, Heller, Michael J
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Sprache:eng
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Zusammenfassung:We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.
ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.6b11361