Design and Fabrication of PDMS MLA Based on Digital Maskless Lithography Method
Polymer MLA is fabricated by used of the DMD-based maskless lithography method. The process flow is described in this paper. The obtained photoresist concave MLA, which is used as a pattern to fabricate PDMS convex MLA, and the resulted PDMS MLA are measured with 3D surface profiler based on scannin...
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| Veröffentlicht in: | Advanced Materials Research 2015-02, Vol.1091, p.71-76 |
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| creator | Kuang, Guo Wen Cui, Xiao Feng Gao, Yi Qing Li, Feng Xu, Guang Tao |
| description | Polymer MLA is fabricated by used of the DMD-based maskless lithography method. The process flow is described in this paper. The obtained photoresist concave MLA, which is used as a pattern to fabricate PDMS convex MLA, and the resulted PDMS MLA are measured with 3D surface profiler based on scanning white light interferometry. Besides, the transmission and reflection spectrum of PDMS film sample are also measured and used to calculate the refractive index of the PDMS film. |
| doi_str_mv | 10.4028/www.scientific.net/AMR.1091.71 |
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Besides, the transmission and reflection spectrum of PDMS film sample are also measured and used to calculate the refractive index of the PDMS film.</description><subject>Digital</subject><subject>Lithography</subject><subject>Mathematical analysis</subject><subject>Photoresists</subject><subject>Reflection</subject><subject>Scanning</subject><subject>Silicone resins</subject><subject>White light interferometry</subject><issn>1022-6680</issn><issn>1662-8985</issn><issn>1662-8985</issn><isbn>3038354309</isbn><isbn>9783038354307</isbn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNqNkF1r2zAUhkU_YEnb_yAojN7YOUe2ZemmLGvWD4jJ6NZrIStyotaxM8kh5N9PJYWNXe1KB52H95zzEPIZIc2Bicl-v0-DcbYbXONM2tlhMq2eUwSJaYknZIScs0RIUZyScQaZyIo8A3kWG8BYwrmAT2QcwisAz5EVI7KY2eBWHdXdkt7r2jujB9d3tG_o91n1g1bzKf2qg13S-DlzKzfollY6vLU2BDp3w7pfeb1dH2hlY728JOeNboO9-ngvyMv9t593j8l88fB0N50nBssMEy7roi6YgKLQYLhh0nJZMtPUdc5Qg5ZLYVEyBFGiFDbjtdFQYyZYk1uoswtyc8zd-v7XzoZBbVwwtm11Z_tdUBhPL3j0wiJ6_Q_62u98F7dTWErAiAoZqdsjZXwfgreN2nq30f6gENS7fBXlqz_yVZSvonz1Ll-VGAO-HAMGr7swWLP-a87_RfwGJvqRRQ</recordid><startdate>20150201</startdate><enddate>20150201</enddate><creator>Kuang, Guo Wen</creator><creator>Cui, Xiao Feng</creator><creator>Gao, Yi Qing</creator><creator>Li, Feng</creator><creator>Xu, Guang Tao</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope></search><sort><creationdate>20150201</creationdate><title>Design and Fabrication of PDMS MLA Based on Digital Maskless Lithography Method</title><author>Kuang, Guo Wen ; Cui, Xiao Feng ; Gao, Yi Qing ; Li, Feng ; Xu, Guang Tao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1731-69b5b528055a0c6c29e6972cfbb421a0a9d8e1921087198e36bca0b1382f4e0b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Digital</topic><topic>Lithography</topic><topic>Mathematical analysis</topic><topic>Photoresists</topic><topic>Reflection</topic><topic>Scanning</topic><topic>Silicone resins</topic><topic>White light interferometry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kuang, Guo Wen</creatorcontrib><creatorcontrib>Cui, Xiao Feng</creatorcontrib><creatorcontrib>Gao, Yi Qing</creatorcontrib><creatorcontrib>Li, Feng</creatorcontrib><creatorcontrib>Xu, Guang Tao</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><jtitle>Advanced Materials Research</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kuang, Guo Wen</au><au>Cui, Xiao Feng</au><au>Gao, Yi Qing</au><au>Li, Feng</au><au>Xu, Guang Tao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Design and Fabrication of PDMS MLA Based on Digital Maskless Lithography Method</atitle><jtitle>Advanced Materials Research</jtitle><date>2015-02-01</date><risdate>2015</risdate><volume>1091</volume><spage>71</spage><epage>76</epage><pages>71-76</pages><issn>1022-6680</issn><issn>1662-8985</issn><eissn>1662-8985</eissn><isbn>3038354309</isbn><isbn>9783038354307</isbn><abstract>Polymer MLA is fabricated by used of the DMD-based maskless lithography method. 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| source | Scientific.net Journals |
| subjects | Digital Lithography Mathematical analysis Photoresists Reflection Scanning Silicone resins White light interferometry |
| title | Design and Fabrication of PDMS MLA Based on Digital Maskless Lithography Method |
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