Designing Multicolored Photonic Micropatterns through the Regioselective Thermal Compression of Inverse Opals

Colloidal assemblies develop pronounced structural colors due to the selective diffraction of light. Micropatterns with multiple structural colors are appealing for the use in a variety of photonic applications. Here, a lithographic approach is reported, which provides a high level of control over the size, shape, and color of a micropattern using the anisotropic shrinkage of inverse opals made of a negative photoresist heated to high temperatures. Shrinkage occurs uniformly across the thickness of the film, leading to a blueshift in the structural color while maintaining a high reflectivity across the full visible spectrum. The rate of shrinkage is determined by the annealing temperature and the photoresist crosslinking density. The rate can, therefore, be spatially modulated by applying UV radiation through a photomask to create multicolor micropatterns from single‐colored inverse opals. The lateral dimensions of the micropattern features can be as small as the thickness of the inverse opal. Multicolored photonic micropatterns with high reflectivity and resolution are simply created by anisotropic shrinkage of inverse opals made of a negative photoresist. The rate of shrinkage is determined by annealing temperature and UV dose, which enables the spatial modulation of structural color through a photolithography. This spatially addressable and rate‐controllable anisotropic compression will benefit a wide range of photonic applications.