Energy band diagram of In: ZnO/p-Si structures deposited using chemical spray pyrolysis technique
Near-ideal In: ZnO/p-Si heterojunction band edge lineup has been investigated with aid of I–V and C–V measurements. The heterojunction was manufactured by spray pyrolysis method of (Zn (CH 3 COO) 2 ·2H 2 O) at different indium doping concentrations on monocrystalline p-type silicon. The experimental...
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Veröffentlicht in: | Applied nanoscience 2014-08, Vol.4 (6), p.695-701 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Near-ideal In: ZnO/p-Si heterojunction band edge lineup has been investigated with aid of I–V and C–V measurements. The heterojunction was manufactured by spray pyrolysis method of (Zn (CH
3
COO)
2
·2H
2
O) at different indium doping concentrations on monocrystalline p-type silicon. The experimental data of the conduction band offset ∆
E
c and valence band offset ∆
E
c were compared with theoretical values. The band offset ∆
E
c = 0.45 eV and ∆
E
v = 1.65 eV obtained at 300 K. The energy band diagram of In: ZnO/p-Si HJ was constructed. C–V measurements depict that the junction was an abrupt type and the built-in voltage was determined from C
−2
–V plot. |
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ISSN: | 2190-5509 2190-5517 |
DOI: | 10.1007/s13204-013-0246-5 |