Towards a uniform and large-scale deposition of MoS sub(2) nanosheets via sulfurization of ultra-thin Mo-based solid films
Large-scale integration of MoS sub(2) in electronic devices requires the development of reliable and cost-effective deposition processes, leading to uniform MoS sub(2) layers on a wafer scale. Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited moly...
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| Veröffentlicht in: | Nanotechnology 2016-04, Vol.27 (17), p.175703-175712 |
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| container_issue | 17 |
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| container_title | Nanotechnology |
| container_volume | 27 |
| creator | Vangelista, Silvia Cinquanta, Eugenio Martella, Christian Alia, Mario Longo, Massimo Lamperti, Alessio Mantovan, Roberto Basset, Francesco Basso Pezzoli, Fabio Molle, Alessandro |
| description | Large-scale integration of MoS sub(2) in electronic devices requires the development of reliable and cost-effective deposition processes, leading to uniform MoS sub(2) layers on a wafer scale. Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited molybdenum solid film and sulfur vapor, thus resulting in a controlled growth of MoS sub(2) films onto SiO sub(2)/Si substrates with a tunable thickness and cm super(2)-scale uniformity. Based on Raman spectroscopy and photoluminescence, we show that the degree of crystallinity in the MoS sub(2) layers is dictated by the deposition temperature and thickness. In particular, the MoS sub(2) structural disorder observed at low temperature ( |
| doi_str_mv | 10.1088/0957-4484/27/17/175703 |
| format | Article |
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Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited molybdenum solid film and sulfur vapor, thus resulting in a controlled growth of MoS sub(2) films onto SiO sub(2)/Si substrates with a tunable thickness and cm super(2)-scale uniformity. Based on Raman spectroscopy and photoluminescence, we show that the degree of crystallinity in the MoS sub(2) layers is dictated by the deposition temperature and thickness. In particular, the MoS sub(2) structural disorder observed at low temperature (<750 degree C) and low thickness (two layers) evolves to a more ordered crystalline structure at high temperature (1000 degree C) and high thickness (four layers). From an atomic force microscopy investigation prior to and after sulfurization, this parametrical dependence is associated with the inherent granularity of the MoS sub(2) nanosheet that is inherited by the pristine morphology of the pre-deposited Mo film. 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Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited molybdenum solid film and sulfur vapor, thus resulting in a controlled growth of MoS sub(2) films onto SiO sub(2)/Si substrates with a tunable thickness and cm super(2)-scale uniformity. Based on Raman spectroscopy and photoluminescence, we show that the degree of crystallinity in the MoS sub(2) layers is dictated by the deposition temperature and thickness. In particular, the MoS sub(2) structural disorder observed at low temperature (<750 degree C) and low thickness (two layers) evolves to a more ordered crystalline structure at high temperature (1000 degree C) and high thickness (four layers). From an atomic force microscopy investigation prior to and after sulfurization, this parametrical dependence is associated with the inherent granularity of the MoS sub(2) nanosheet that is inherited by the pristine morphology of the pre-deposited Mo film. 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| ispartof | Nanotechnology, 2016-04, Vol.27 (17), p.175703-175712 |
| issn | 0957-4484 1361-6528 |
| language | eng |
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| source | Institute of Physics Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Deposition Electronic devices Molybdenum Molybdenum disulfide Nanostructure Sulfur Sulfurization Thickness |
| title | Towards a uniform and large-scale deposition of MoS sub(2) nanosheets via sulfurization of ultra-thin Mo-based solid films |
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