Towards a uniform and large-scale deposition of MoS sub(2) nanosheets via sulfurization of ultra-thin Mo-based solid films

Large-scale integration of MoS sub(2) in electronic devices requires the development of reliable and cost-effective deposition processes, leading to uniform MoS sub(2) layers on a wafer scale. Here we report on the detailed study of the heterogeneous vapor-solid reaction between a pre-deposited molybdenum solid film and sulfur vapor, thus resulting in a controlled growth of MoS sub(2) films onto SiO sub(2)/Si substrates with a tunable thickness and cm super(2)-scale uniformity. Based on Raman spectroscopy and photoluminescence, we show that the degree of crystallinity in the MoS sub(2) layers is dictated by the deposition temperature and thickness. In particular, the MoS sub(2) structural disorder observed at low temperature (