74-3: Multicolor 1250 ppi OLED Arrays Patterened by Photolithography

74-3: Multicolor 1250 ppi OLED Arrays Patterened by Photolithography

In this paper, we demonstrate multicolor OLEDs patterned sideby‐side by photolithography. 1250 ppi arrays with 10 μm subpixel pitch are shown. The chemically amplified, i‐line photoresist enables submicron pitch and aperture ratio above 60%. OLED photolithography paves the road to cost‐effective, fu...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2016-05, Vol.47 (1), p.1009-1012
Hauptverfasser: Malinowski, Pawel E., Ke, TungHuei, Nakamura, Atsushi, Vicca, Peter, Wuyts, Magalie, Gu, Danli, Steudel, Sören, Janssen, Dimitri, Kamochi, Yoshitaka, Koyama, Ichiro, Iwai, Yu, Heremans, Paul
Format: Artikel
Sprache:eng
Schlagworte:
AMOLED displays
Amplification
Apertures
Arrays
Displays
Photolithography
Photoresists
RGB OLEDs
Roads
Technical papers
ultra-high resolution
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Zusammenfassung:In this paper, we demonstrate multicolor OLEDs patterned sideby‐side by photolithography. 1250 ppi arrays with 10 μm subpixel pitch are shown. The chemically amplified, i‐line photoresist enables submicron pitch and aperture ratio above 60%. OLED photolithography paves the road to cost‐effective, full‐color displays with 4K and 8K resolution.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.10905