The effect of small pyramid texturing on the enhanced passivation and efficiency of single c-Si solar cells
In this work, a simple method to form small random pyramid texturing (0.5-2 μm size) is proposed to enhance the surface passivation of commercial p-type Cz-Si wafers. Small pyramid texturing was generated with chemical nano-masking for anisotropic etching. The surface recombination velocity obtained...
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Veröffentlicht in: | RSC advances 2016-01, Vol.6 (55), p.49831-49838 |
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Sprache: | eng |
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Zusammenfassung: | In this work, a simple method to form small random pyramid texturing (0.5-2 μm size) is proposed to enhance the surface passivation of commercial p-type Cz-Si wafers. Small pyramid texturing was generated with chemical nano-masking for anisotropic etching. The surface recombination velocity obtained after the passivation of the thermal oxide layer reduced from 65 and 10 cm s
−1
for the large pyramids (10-15 μm size) and small pyramid (0.5-2 μm) texturing respectively. The solar cell fabricated with large pyramid texturing resulted in an efficiency of 17.82% with a current density (
J
SC
) of 36.91 mA cm
−2
, an open circuit voltage (
V
OC
) of 620 mV whereas small pyramid texturing resulted in an efficiency of 18.5% with
J
SC
of 37.6 mA cm
−2
and
V
OC
of 628 mV. The low surface recombination velocity increases the
V
OC
by 8 mV. The small pyramid textured wafers are found to enhance the quantum efficiency performance in both short and long wavelength regions.
In this work, small random pyramid texturing (0.5-2 μm size) was generated with chemical nano-masking, to enhance the surface passivation of commercial p-type Cz-Si wafers. |
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ISSN: | 2046-2069 2046-2069 |
DOI: | 10.1039/c6ra05321a |