Layer-Confined Excitonic Insulating Phase in Ultrathin Ta2NiSe5 Crystals

Atomically thin nanosheets, as recently realized using van der Waals layered materials, offer a versatile platform for studying the stability and tunability of the correlated electron phases in the reduced dimension. Here, we investigate a thickness-dependent excitonic insulating (EI) phase on a lay...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:ACS nano 2016-09, Vol.10 (9), p.8888-8894
Hauptverfasser: Kim, So Young, Kim, Youngwook, Kang, Chang-Jong, An, Eun-Su, Kim, Hyoung Kug, Eom, Man Jin, Lee, Minkyung, Park, Chibeom, Kim, Tae-Hwan, Choi, Hee Cheul, Min, Byung Il, Kim, Jun Sung
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Atomically thin nanosheets, as recently realized using van der Waals layered materials, offer a versatile platform for studying the stability and tunability of the correlated electron phases in the reduced dimension. Here, we investigate a thickness-dependent excitonic insulating (EI) phase on a layered ternary chalcogenide Ta2NiSe5. Using Raman spectroscopy, scanning tunneling spectroscopy, and in-plane transport measurements, we found no significant changes in crystalline and electronic structures as well as disorder strength in ultrathin Ta2NiSe5 crystals with a thickness down to five layers. The transition temperature, T c, of ultrathin Ta2NiSe5 is reduced from its bulk value by Δ T c/T c bulk ≈ −9%, which strongly contrasts the case of 1T-TiSe2, another excitonic insulator candidate, showing an increase of T c by Δ T c/T c bulk ≈ +30%. This difference is attributed to the dominance of interband Coulomb interaction over electron–phonon interaction and its zero-ordering wave vector due to the direct band gap structure of Ta2NiSe5. The out-of-plane correlating length of the EI phase is estimated to have monolayer thickness, suggesting that the EI phase in Ta2NiSe5 is highly layer-confined and in the strong coupling limit.
ISSN:1936-0851
1936-086X
DOI:10.1021/acsnano.6b04796