Investigating the chemical mist deposition technique for poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) on textured crystalline-silicon for organic/crystalline-silicon heterojunction solar cells

Chemical mist deposition (CMD) of poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) was investigated in terms of cavitation frequency f, solvent, flow rate of nitrogen, substrate temperature Ts, and substrate dc bias Vs as variables for efficient PEDOT:PSS/crystalline silicon (c-S...

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Veröffentlicht in:Japanese Journal of Applied Physics 2016-03, Vol.55 (3), p.31601
Hauptverfasser: Hossain, Jaker, Ohki, Tatsuya, Ichikawa, Koki, Fujiyama, Kazuhiko, Ueno, Keiji, Fujii, Yasuhiko, Hanajiri, Tatsuro, Shirai, Hajime
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Sprache:eng
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