Near infrared light-emitting diodes based on n-InN/p-NiO/p-Si heterojunction

We fabricated the light-emitting diodes (LEDs) consisting of n-InN/p-NiO/p-Si heterostructure by using plasma-assisted molecular beam epitaxy (PAMBE) combined with radio frequency (RF) magnetron sputtering. The device exhibited diode-like rectifying current–voltage characteristics and had a turn-on voltage of 2.0V. Under forward bias, a prominent narrow near infrared (NIR) emission peaked around 1565nm was observed at room temperature. The NIR emission was demonstrated to come from the band-edge emission of InN layer. Moreover, the study of the LED in terms of the stability and efficiency were also discussed in detail. •Near infrared light-emitting diodes based on n-InN/p-NiO/p-Si were realized by PAMBE.•The NiO film was acted as the p-type conducting layer for hole carriers.•The heterojunction exhibited a prominent narrow NIR emission peaked around 1565nm.•The NIR emission was demonstrated to come from the band-edge emission of InN layer.