150 A SiC V-groove trench gate MOSFET with 6 x 6 mm super(2) chip size on a 150 mm C-face in-house epitaxial wafer

We report the successful demonstration of large current and high-speed switching properties of SiC V-groove trench gate MOSFETs (VMOSFETs). A drain current of 150 A (at super(V) sub(DS)= 2 V and V sub(GS)= 18 V) and breakdown voltage of 960 V were achieved from a packaged 6 x 6 mm super(2) single ch...

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Veröffentlicht in:Japanese Journal of Applied Physics 2016-04, Vol.55 (4)
Hauptverfasser: Saitoh, Yu, Itoh, Hironori, Wada, Keiji, Sakai, Mitsuhiko, Horii, Taku, Hiratsuka, Kenji, Tanaka, So, Mikamura, Yasuki
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Sprache:eng
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Zusammenfassung:We report the successful demonstration of large current and high-speed switching properties of SiC V-groove trench gate MOSFETs (VMOSFETs). A drain current of 150 A (at super(V) sub(DS)= 2 V and V sub(GS)= 18 V) and breakdown voltage of 960 V were achieved from a packaged 6 x 6 mm super(2) single chip. Moreover, short switching times of t sub(r)= 81 ns and t sub(f)= 32 ns were also obtained. To fabricate such VMOSFETs with high yield, highly uniform in-house epitaxial growth technology on a 150-mm-diameter wafer is also one of the keys, owing to its characteristic dependence on drift layer carrier concentration.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.55.04ER05