150 A SiC V-groove trench gate MOSFET with 6 x 6 mm super(2) chip size on a 150 mm C-face in-house epitaxial wafer
We report the successful demonstration of large current and high-speed switching properties of SiC V-groove trench gate MOSFETs (VMOSFETs). A drain current of 150 A (at super(V) sub(DS)= 2 V and V sub(GS)= 18 V) and breakdown voltage of 960 V were achieved from a packaged 6 x 6 mm super(2) single ch...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2016-04, Vol.55 (4) |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We report the successful demonstration of large current and high-speed switching properties of SiC V-groove trench gate MOSFETs (VMOSFETs). A drain current of 150 A (at super(V) sub(DS)= 2 V and V sub(GS)= 18 V) and breakdown voltage of 960 V were achieved from a packaged 6 x 6 mm super(2) single chip. Moreover, short switching times of t sub(r)= 81 ns and t sub(f)= 32 ns were also obtained. To fabricate such VMOSFETs with high yield, highly uniform in-house epitaxial growth technology on a 150-mm-diameter wafer is also one of the keys, owing to its characteristic dependence on drift layer carrier concentration. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.55.04ER05 |