A high density FinFET one-time programmable cell with new intra-fin cell isolation for advanced system on chip applications
A fully CMOS compatible one-time programmable (OTP) cell with a novel intra-fin cell isolation (IFCI) structure on a FinFET CMOS process has been proposed. The IFCI OTP cell utilizes the field-enhanced dielectric breakdown at fin corners to perform a fast and low-voltage program operation. Moreover,...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2016-04, Vol.55 (4S), p.4 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A fully CMOS compatible one-time programmable (OTP) cell with a novel intra-fin cell isolation (IFCI) structure on a FinFET CMOS process has been proposed. The IFCI OTP cell utilizes the field-enhanced dielectric breakdown at fin corners to perform a fast and low-voltage program operation. Moreover, an ultrasmall intra-fin cell-to-cell isolation is firstly introduced to markedly shrink the cell size by eliminating the area-consuming spacing of fin-to-fin isolation. The IFCI FinFET OTP with fast program speed, excellent read disturb immunity, and reliable data retention is a promising solution for logic nonvolatile memory (NVM) technology in advanced CMOS nodes. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.55.04EE06 |