A high density FinFET one-time programmable cell with new intra-fin cell isolation for advanced system on chip applications

A fully CMOS compatible one-time programmable (OTP) cell with a novel intra-fin cell isolation (IFCI) structure on a FinFET CMOS process has been proposed. The IFCI OTP cell utilizes the field-enhanced dielectric breakdown at fin corners to perform a fast and low-voltage program operation. Moreover,...

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Veröffentlicht in:Japanese Journal of Applied Physics 2016-04, Vol.55 (4S), p.4
Hauptverfasser: Chen, Yu-Zheng, Yuan, Jo En, Peng, Ping Chun, Hsiao, Woan Yun, King, Ya-Chin, Lin, Chrong Jung
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Sprache:eng
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Zusammenfassung:A fully CMOS compatible one-time programmable (OTP) cell with a novel intra-fin cell isolation (IFCI) structure on a FinFET CMOS process has been proposed. The IFCI OTP cell utilizes the field-enhanced dielectric breakdown at fin corners to perform a fast and low-voltage program operation. Moreover, an ultrasmall intra-fin cell-to-cell isolation is firstly introduced to markedly shrink the cell size by eliminating the area-consuming spacing of fin-to-fin isolation. The IFCI FinFET OTP with fast program speed, excellent read disturb immunity, and reliable data retention is a promising solution for logic nonvolatile memory (NVM) technology in advanced CMOS nodes.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.55.04EE06