Taguchi approach-assisted optimization of spraying in non-solvent process for preparation of potassium perchlorate nanoparticles
In this study, Taguchi robust design as a statistical route was utilized to optimize the variables of spraying in non-solvent process in order to achieve KClO 4 nanoparticles. The experimental factors of the spraying in non-solvent technique, which may be effective in KClO 4 particle size, were opti...
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Veröffentlicht in: | Journal of sol-gel science and technology 2015-12, Vol.76 (3), p.510-518 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this study, Taguchi robust design as a statistical route was utilized to optimize the variables of spraying in non-solvent process in order to achieve KClO
4
nanoparticles. The experimental factors of the spraying in non-solvent technique, which may be effective in KClO
4
particle size, were optimized efficiently via Taguchi method. The procedure operating conditions, i.e., KClO
4
concentration, solvent ratio, non-solvent identity, and spray steps, were considered at triple levels. The role of these operating conditions on the size of resulted KClO
4
particles was evaluated quantitatively by analysis of variance (ANOVA). It was found that the particle size of KClO
4
prepared by spraying in non-solvent technique might be adjusted efficiently by tuning the main parameters at the corresponding optimum level. Moreover, the optimal conditions for the preparing of KClO
4
nanoparticles via the studied method were proposed. The ANOVA exhibited that 3 % (w/v) as KClO
4
concentration, CHCl
3
as type of non-solvent, solvent to non-solvent ratio of 1:6, and single-step spraying are optimal conditions for the production of KClO
4
nanoparticles by spraying in non-solvent. Experimental data revealed that at optimum conditions of the process, the average particle size of produced KClO
4
is about 41 nm. Meantime, KClO
4
nanoparticles were prepared by supercritical carbon dioxide anti-solvent process for comparison. It was found that the size of the produced KClO
4
particles is about 55 nm.
Graphical Abstract |
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ISSN: | 0928-0707 1573-4846 |
DOI: | 10.1007/s10971-015-3801-6 |