Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor

We propose a dynamic threshold voltage j unctionless tunnel FET (DT-JLTFET) in wnlcn me mresnolu voltage can be dynamically adjusted, resulting in higher ON-current. Through 2D numerical simulations, it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to...

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Veröffentlicht in:Journal of semiconductors 2014-11, Vol.35 (11), p.32-39
Hauptverfasser: Basak, Shibir, Asthana, Pranav Kumar, Goswami, Yogesh, Ghosh, Bahniman
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container_issue 11
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container_title Journal of semiconductors
container_volume 35
creator Basak, Shibir
Asthana, Pranav Kumar
Goswami, Yogesh
Ghosh, Bahniman
description We propose a dynamic threshold voltage j unctionless tunnel FET (DT-JLTFET) in wnlcn me mresnolu voltage can be dynamically adjusted, resulting in higher ON-current. Through 2D numerical simulations, it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate. The impact of the threshold voltage shift on the overall performance of the device is also studied. A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Sio.7Geo.3 source JLTFET.
doi_str_mv 10.1088/1674-4926/35/11/114001
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1800476473</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><cqvip_id>662904039</cqvip_id><sourcerecordid>1800476473</sourcerecordid><originalsourceid>FETCH-LOGICAL-c262t-89170c18c6df1d112f673434e0172616e2db1eee7e21ad5afa317a39fdf6b4363</originalsourceid><addsrcrecordid>eNo9kM1KAzEUhWehYK2-ggRXbmpzJ2kys5SqVSi4UNchzdy0KdOkTTJC394ZWgoXDpfzs_iK4gHoM9CqmoKQfMLrUkzZbArQH6cUrorRxbgpblPaUtr_HEYFvh693jlD8iZi2oS2IX-hzXqNJOwx6uyCJ86Tb0e0b3pZIEmhiwbJtvNmsFtMieTOe2yJddgvoLVoMslR--RSDvGuuLa6TXh_1nHx-_72M_-YLL8Wn_OX5cSUosyTqgZJDVRGNBYagNIKyTjjSEGWAgSWzQoQUWIJuplpqxlIzWrbWLHiTLBx8XTa3cdw6DBltXPJYNtqj6FLCipKuRRcsj4qTlETQ0oRrdpHt9PxqICqgaUakKkBmWIzBaBOLPvi47m4CX59cH59aQpR1pRTVrN_Sf92Lg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1800476473</pqid></control><display><type>article</type><title>Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor</title><source>IOP Publishing Journals</source><source>Alma/SFX Local Collection</source><creator>Basak, Shibir ; Asthana, Pranav Kumar ; Goswami, Yogesh ; Ghosh, Bahniman</creator><creatorcontrib>Basak, Shibir ; Asthana, Pranav Kumar ; Goswami, Yogesh ; Ghosh, Bahniman</creatorcontrib><description>We propose a dynamic threshold voltage j unctionless tunnel FET (DT-JLTFET) in wnlcn me mresnolu voltage can be dynamically adjusted, resulting in higher ON-current. Through 2D numerical simulations, it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate. The impact of the threshold voltage shift on the overall performance of the device is also studied. A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Sio.7Geo.3 source JLTFET.</description><identifier>ISSN: 1674-4926</identifier><identifier>DOI: 10.1088/1674-4926/35/11/114001</identifier><language>eng</language><subject>Adjustment ; Dynamics ; Field effect transistors ; Semiconductor devices ; Semiconductors ; SiGe ; Silicon ; Silicon germanides ; Threshold voltage ; 动态调整 ; 场效应晶体管 ; 操作 ; 硅 ; 门限电压 ; 阈值电压 ; 隧道</subject><ispartof>Journal of semiconductors, 2014-11, Vol.35 (11), p.32-39</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c262t-89170c18c6df1d112f673434e0172616e2db1eee7e21ad5afa317a39fdf6b4363</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/94689X/94689X.jpg</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Basak, Shibir</creatorcontrib><creatorcontrib>Asthana, Pranav Kumar</creatorcontrib><creatorcontrib>Goswami, Yogesh</creatorcontrib><creatorcontrib>Ghosh, Bahniman</creatorcontrib><title>Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor</title><title>Journal of semiconductors</title><addtitle>Chinese Journal of Semiconductors</addtitle><description>We propose a dynamic threshold voltage j unctionless tunnel FET (DT-JLTFET) in wnlcn me mresnolu voltage can be dynamically adjusted, resulting in higher ON-current. Through 2D numerical simulations, it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate. The impact of the threshold voltage shift on the overall performance of the device is also studied. A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Sio.7Geo.3 source JLTFET.</description><subject>Adjustment</subject><subject>Dynamics</subject><subject>Field effect transistors</subject><subject>Semiconductor devices</subject><subject>Semiconductors</subject><subject>SiGe</subject><subject>Silicon</subject><subject>Silicon germanides</subject><subject>Threshold voltage</subject><subject>动态调整</subject><subject>场效应晶体管</subject><subject>操作</subject><subject>硅</subject><subject>门限电压</subject><subject>阈值电压</subject><subject>隧道</subject><issn>1674-4926</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo9kM1KAzEUhWehYK2-ggRXbmpzJ2kys5SqVSi4UNchzdy0KdOkTTJC394ZWgoXDpfzs_iK4gHoM9CqmoKQfMLrUkzZbArQH6cUrorRxbgpblPaUtr_HEYFvh693jlD8iZi2oS2IX-hzXqNJOwx6uyCJ86Tb0e0b3pZIEmhiwbJtvNmsFtMieTOe2yJddgvoLVoMslR--RSDvGuuLa6TXh_1nHx-_72M_-YLL8Wn_OX5cSUosyTqgZJDVRGNBYagNIKyTjjSEGWAgSWzQoQUWIJuplpqxlIzWrbWLHiTLBx8XTa3cdw6DBltXPJYNtqj6FLCipKuRRcsj4qTlETQ0oRrdpHt9PxqICqgaUakKkBmWIzBaBOLPvi47m4CX59cH59aQpR1pRTVrN_Sf92Lg</recordid><startdate>20141101</startdate><enddate>20141101</enddate><creator>Basak, Shibir</creator><creator>Asthana, Pranav Kumar</creator><creator>Goswami, Yogesh</creator><creator>Ghosh, Bahniman</creator><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W92</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20141101</creationdate><title>Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor</title><author>Basak, Shibir ; Asthana, Pranav Kumar ; Goswami, Yogesh ; Ghosh, Bahniman</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c262t-89170c18c6df1d112f673434e0172616e2db1eee7e21ad5afa317a39fdf6b4363</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Adjustment</topic><topic>Dynamics</topic><topic>Field effect transistors</topic><topic>Semiconductor devices</topic><topic>Semiconductors</topic><topic>SiGe</topic><topic>Silicon</topic><topic>Silicon germanides</topic><topic>Threshold voltage</topic><topic>动态调整</topic><topic>场效应晶体管</topic><topic>操作</topic><topic>硅</topic><topic>门限电压</topic><topic>阈值电压</topic><topic>隧道</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Basak, Shibir</creatorcontrib><creatorcontrib>Asthana, Pranav Kumar</creatorcontrib><creatorcontrib>Goswami, Yogesh</creatorcontrib><creatorcontrib>Ghosh, Bahniman</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-工程技术</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of semiconductors</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Basak, Shibir</au><au>Asthana, Pranav Kumar</au><au>Goswami, Yogesh</au><au>Ghosh, Bahniman</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor</atitle><jtitle>Journal of semiconductors</jtitle><addtitle>Chinese Journal of Semiconductors</addtitle><date>2014-11-01</date><risdate>2014</risdate><volume>35</volume><issue>11</issue><spage>32</spage><epage>39</epage><pages>32-39</pages><issn>1674-4926</issn><abstract>We propose a dynamic threshold voltage j unctionless tunnel FET (DT-JLTFET) in wnlcn me mresnolu voltage can be dynamically adjusted, resulting in higher ON-current. Through 2D numerical simulations, it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate. The impact of the threshold voltage shift on the overall performance of the device is also studied. A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Sio.7Geo.3 source JLTFET.</abstract><doi>10.1088/1674-4926/35/11/114001</doi><tpages>8</tpages></addata></record>
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subjects Adjustment
Dynamics
Field effect transistors
Semiconductor devices
Semiconductors
SiGe
Silicon
Silicon germanides
Threshold voltage
动态调整
场效应晶体管
操作

门限电压
阈值电压
隧道
title Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T23%3A24%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Dynamic%20threshold%20voltage%20operation%20in%20Si%20and%20SiGe%20source%20junctionless%20tunnel%20field%20effect%20transistor&rft.jtitle=Journal%20of%20semiconductors&rft.au=Basak,%20Shibir&rft.date=2014-11-01&rft.volume=35&rft.issue=11&rft.spage=32&rft.epage=39&rft.pages=32-39&rft.issn=1674-4926&rft_id=info:doi/10.1088/1674-4926/35/11/114001&rft_dat=%3Cproquest_cross%3E1800476473%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1800476473&rft_id=info:pmid/&rft_cqvip_id=662904039&rfr_iscdi=true