Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication

Cost of silicon carbide (SiC) wafer has been improved owing to the development of larger and higher quality wafer technologies, while the process stays long and complicated. In this paper, we propose a novel short process of ion implantation and fabricate model SiC schotky barrier diodes (SiC-SBDs) devices. Currently common mask layer of ion implantation employs high heat resistant materials such as metal oxides. Because the ion is implanted to SiC wafer at high temperature between 300 °C and 800 °C due to avoiding the damage of SiC crystal structure. The process using oxide layer tends to became long and complicated. On the other hand, our proposal process uses a heat resistant photoresist material as the mask instead of the oxide layer. The heat resistant photoresist is applied to newly developed “SP-D1000” produced by Toray Industries, Inc.. We demonstrated to fabricate the model SiC-SBDs devices based on our proposal process with “SP-D1000” and confirmed the device working as same as a current process.