Recent EUV Resists toward High Volume Manufacturing

Recent EUV Resists toward High Volume Manufacturing

Extreme ultraviolet lithography (EUVL) has been an attractive method as next generation lithography (NGL) over 20 years, and high-volume manufacturing (HVM) is now going to be realized by great progresses in materials as well as EUV source power enhancement. In this paper, recent reported materials...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2014/12/29, Vol.27(6), pp.739-746
Hauptverfasser: Nakagawa, Hisashi, Naruoka, Takehiko, Nagai, Tomoki
Format: Artikel
Sprache:eng
Schlagworte:
Extreme ultraviolet lithography
Hydroxides
Inorganic materials
Lithography
Next generation lithography
Organic materials
Photopolymers
Resists
Ultraviolet
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Zusammenfassung:Extreme ultraviolet lithography (EUVL) has been an attractive method as next generation lithography (NGL) over 20 years, and high-volume manufacturing (HVM) is now going to be realized by great progresses in materials as well as EUV source power enhancement. In this paper, recent reported materials for EUVL are summarized ranging from conventional organic material base resists to novel inorganic material base resists.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.27.739