Structural Investigation of Si Quantum Dots Grown by CVD on AlN/Si(111) and 3C-SiC/Si(100) Epilayers

Structural investigations of Si quantum dots (QDs) grown by CVD on two different heterostructures: AlN/Si (111) and 3C-SiC/Si (100) are conducted. The Si QDs have been grown using silane as precursor, diluted in hydrogen, at fixed temperature and pressure (830°C - 800mbar). High densities of dots can be obtained (up to 1011 cm-2) with typical heights below 10nm. The kinetic of deposition lets suppose the presence of an initial wetting layer before the dots formation. Different durations are required for nucleating dots on AlN and 3C-SiC. Si QDs on AlN present a luminescence band which can be attributed to quantum confinement.